Thin films department
Smooth. Fast. Vacuum packed.
We have large experience in thin films coatings for scientific and commercial applications. Ion-Beam Sputtering Deposition via Kaufman source provides 1-300 nm amorphous films with roughness up to 0,2 nm. Our technology allows to deposit thin films on 50*50 mm substrates with thickness gradient less than 1% and perfectly fits requirements of optical elements.
High purity targets are available for sputtering, also it is possible to grow films in O2 and activated N2 atmosphere to form oxide and nitride films.
BN Al Al2O3 Si
SiO2 Ti Fe Fe3Si
Ni Cu Zr Mo
Ag Sn Ta W
… and combinations (up to 3 targets in one process).
Typical time of production on provided substrates is 4 weeks including calibration, test samples, and evaluation
Surficial roughness examples
SiO2 (Rms=0.28 nm)
W (Rms=0.16 nm)
Ta (Rms=0.32 nm)
Among our successful cases are broadband monochromator in range of 6-17 keV for synchrotron station, multilayers for generation of X-ray standing wave in research purposes, and most recent magnetic reference layers for neutron reflectometry investigations. Our scientific experience in thin films opens opportunities to accompany any challenging project. Additional investigation of coatings by X-ray reflectometry, atomic-force microscopy, energy-dispersive spectroscopy, and Rutherford backscattering spectroscopy are also available.
Monochromatizating of synchrotron radiation
Polarized Neutron Reflectometry with magnetic switching
X-ray Standing Wave investigations at synchrotrons
All produced structures carefully packed in individual cases and stored in vacuum conditions. Thus, we guarantee safe delivery and storage without surface spoiling by oxidation process and dust accumulation.